Microstructure and Optical Characterization of Magnetron Sputtered NbN Thin Films

Some fundamental studies on the preparation, structure and optical properties of NbN films were carried out. NbN thin films were deposited by DC reactive magnetron sputtering at different N2 partial pressures and different substrate temperatures ranging from –50 ℃ to 600 ℃. X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM) were employed to characterize their phase com- ponents, microstructures, grain sizes and surface morphology. Optical properties inclusive of refractive indexes, extinction coefficients and transmittance of the NbN films under different sputtering conditions were measured. With the increase in the N2 partial pressure, δ-NbN phase structure gets forming and the grain size and lattice constant of the cubic NbN increasing. The deposited NbN film has relatively high values of refractive index and extinction coefficient in the wavelength ranging from 240 nm to 830 nm. Substrate tem- perature exerts notable influences on the microstructure and optical transmittance of the NbN films. The grain sizes of the δ-NbN film remarkably increase with the rise of the substrate temperature, while the transmittance of the films with the same thickness decreases. Ultra-fine granular film with particle size of several nanometers forms when the substrate is cooled to –50 ℃, and a remarkable aug- mentation of transmittance could be noticed under so low a temperature.     

Kinetic Monte Carlo Simulation of EB-PVD Film:Effects of Substrate Temperature

The 2D kinetic Monte Carlo (KMC) simulation was used to study the effects of different substrate temperatures on the microstruc-ture of Ni-Cr films in the process of deposition by the electron beam physical vapor deposition (EB-PVD). In the KMC model, substrate was assumed to be a “surface” of tight-packed rows, and the simulation includes two phenomena: adatom-surface collision and adatom diffusion. While the interaction between atoms was described by the embedded atom method, the jumping energy was calculated by the molecular static (MS) calculation. The initial location of the adatom was defined by the Momentum Scheme. The results reveal that there exists a critical substrate temperature which means that the lowest packing density and the highest surface roughness structure will be achieved when the temperature is lower than the smaller critical value, while the roughness of both surfaces and the void contents keep decreasing with the substrate temperature increasing until it reaches the higher critical value. The results also indicate that the critical substrate temperature rises as the deposition rate increases.     

功率谱密度(PSD)在评价超精密光学表面中的应用研究

用原子力显微镜对不同工艺下获得的超光滑反射镜基片进行了功率谱密度(PSD)检测,并对结果进行分析,以指导光学元件加工。     

栅极偏压对纳米金刚石薄膜沉积过程的影响

在HFCVD系统中施加栅极偏压和衬底偏压,采用双偏压成核和栅极偏压生长的方法成功制备了高质量的纳米金刚石薄膜.采用显微Raman高分辨率SEM和AFM等现代理化分析手段分析纳米金刚石膜的微结构,结果表明双偏压显著促进了金刚石的成核密度,平均晶粒尺寸在20 nm以内.试验观察和理论分析表明栅极偏压促进了热丝附近的等离子体浓度,提高了衬底附近的碳氢基团和氢原子浓度,提高了金刚石的成核密度、在保持晶粒的纳米尺寸的同时保持了较高的成膜质量和较低的生长缺陷.     

光学基片表面软质抛光胶体粒子的激光清洗

介绍了光学基片表面软质抛光胶体粒子激光清洗的基本方法、原理和实验装置,并通过对含有污染微粒的基片表面进行激光清洗,获得了高洁净表面的光学基片.     

高精度YAG超平光学基片高效范成法超精磨削的研究

随着YAG新型显示材料制成的高清晰度电视即将投放市场，使得YAG光学基片的批量生产和成本问题面临严峻考验．为了保证产品质量和企业生产效益，提出了大直径高精度YAG光学基片范成法超精磨削的设想．通过实验验证表明，该方法不仅能高效高质量生产合格的YAG光学基片，大幅度降低制造成本，而且为该方法在其它光学材料加工上的应用也奠定了基础．     

碳/环氧复合材料两次表面镜基板研制

文章介绍了碳/环氧复合材料两次表面镜基板的结构与铺层、选材与成型工艺,性能测试等内容。     

KrF激光照射约束层靶驱动产生高速飞片研究

微小空间碎片的超高速撞击对航天器性能有重要影响。为了研究撞击损伤机制,在"天光一号"装置上开展了Kr F准分子激光照射约束层靶产生高速飞片的实验研究,利用成像速度干涉仪(Imaging-VISAR)对飞片自由面速度进行诊断。采用1.9 J准分子激光将10μm的Al飞片加速至12 km/s,且整个过程为准等熵加载。研究结果表明准等熵加载下激光能量转化为飞片动能的效率(达39.4%)比冲击加载要高得多,飞片速度也高于后者。     

K波段基片集成波导带通滤波器的设计

基片集成波导(Substrate Integrated Waveguide,SIW)是一种低插损、低辐射、高品质因素的导波结构。文章利用基片集成波导技术设计了一种K波段带通滤波器,其中心频率为19.4GHz,相对带宽为7.48%,插损小于1dB,该滤波器具有体积小、重量轻、易于加工和集成等优点。     

基于微型压力传感器阵列的翼面压力分布直接测量系统

研发了微型压力传感器并构成柔性衬底基阵列,直接置于翼型外表面实现压力分布测量.结合传感器特性和气动测量需求,设计了压力传感器阵列恒流驱动电路和差分滤波电路,并通过LabVIEW调用所开发的MAT-LAB的应用程序实现了数据的在线处理和实时显示.结合NACA0012翼型对该测压系统进行了低速风洞实验.对其有效进行了初步验证.